Effects of N2 Flow Rate and Substrate Temperature on (Ti, Al)N Films Deposited by Reactive Sputtering

LIU Xin, YU Zhi-ming, YIN Deng-feng, SU Wei-tao, YANG Li

Mining and Metallurgical Engineering ›› 2004, Vol. 24 ›› Issue (5) : 80-82.

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PDF(173 KB)
Mining and Metallurgical Engineering ›› 2004, Vol. 24 ›› Issue (5) : 80-82.

Effects of N2 Flow Rate and Substrate Temperature on (Ti, Al)N Films Deposited by Reactive Sputtering

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2004, 24(5): 80-82

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